GASES & CHEMICALS
Measuring H2O and HF Impurities in NF3 Gas
Nitrogen Fluoride (NF3) has several important industrial uses today, including manufacturing of semiconductor chips, flat panel displays, and solar cells. With increasing demand for LED / OLED displays, the global market for NF3 is expected to continue to soar over the next several years.
In the electronics industry, the main use for NF3 gas is for cleaning process chambers in the manufacturing of silicon chips. The benefits of using NF3 compared to other cleaning agents include safety, stability at room temperature, ease of handling, and lower greenhouse gas emissions than its predecessors.
Tiger Optics HALO product family can detect down to single-digit parts-per-billion (ppb) levels of H2O and HF in NF3, guaranteeing product purity for the end-users. The main advantages of Tiger’s CRDS over incumbent technologies like FTIR, for this application, are:
- Significantly lower gas consumption
- Excellent accuracy
- Long term stability
- Ease of use