Semiconductor Process Tools


Tiger Optics’ HALO and LaserTrace systems are used extensively in Atomic Layer Deposition (ALD), Low-Temperature Epitaxy and MOCVD chambers. The ability to measure moisture in chamber exhaust lines provides a total quality check for incoming gases, cleaning gases, chamber state and/or leaks and purge procedures. 

The HALO RP and LaserTrace 3x systems operate at pressures as low as 50 Torr. While the HALO RP is a single-channel system, the LaserTrace 3x can monitor up to four points at the chamber simultaneously during purge or ramp steps in the standard production runs. The new HALO QRP has been developed to monitor the latest generation of tools at pressures as low as 1 Torr (and below). Its fast speed of response and wide pressure range (as high as 1000 Torr) allows the use of a manifold system to connect multiple load locks, wafer transfer and deposition chambers to a single instrument.

Overview of Tiger Optics' moisture monitoring solutions for semiconductor tools by pressure range:

Select applications include:

Low-Temperature SixGey Epitaxy Atomic Layer Deposition (ALD) MOCVD

Related Resources

Moisture Monitoring in Low-Temperature Silicon-Germanium Epitaxy
Application Notes

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CRDS Becomes Method of Choice for SEMI F112
Technical Publications

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